Tystar Oxidation

Tystar Wet Oxidation (Tube 7)


Book this tool for wet oxidation processes. For dry oxidation, use Tystar Oxidation (dry). This tube is currently restricted to virgin Si prime wafers, or processed Si/SOI wafers containing silicon oxide or nitride.


  • Holds up to 50 100 mm or 150 mm wafers (vertically in quartz boats).
  • Maximum temperature of 1100 °C.
  • Standard recipes exist for dry and wet oxidation, with excellent uniformity (<0.5% across a batch) and agreement with theoretical curves.