In-situ analysis and deep learning segmentation
Choose the right techniques for multi-layer film analysis
on January 25, 2022
Cross sectional analysis plays an important role in thin film characterization. Various techniques are available at the nanoFAB for compositional and morphological analysis of mutli-layer thin film stacks, including XPS Depth-Profiling, SEM/EDX, TEM/EDX. These techniques work complementarily to each other. It is important to choose the most suitable one(s) for your characterization needs. Here, we […]
Hitachi S4800 FESEM is Available
on January 2, 2022
The nanoFAB is pleased to announce that a Hitachi S4800 FESEM has been fully commissioned and now is available for user training. The S4800 is equipped with a cold field-emission gun(c-FEG) and configured with various imaging detectors. The Hitachi S4800 FESEM features: Resolution: 1 nm (SE @15 kV); 2 nm (SE @1 kV); 1.4 nm […]
Multi-Ion Beam FIB/SEM is Operational
on October 8, 2021
TEM Sample Preparation and Advanced Ion Milling
Career Opportunities – Norcada Inc.
on March 9, 2022
The nanoFAB is pleased to post the following career opportunity at Norcada for a MEMS Production Engineer. The details of the position including responsibilities, qualifications, experiences and education are listed in the below link. MEMS Production Engineer
Career Opportunities – Norcada Inc.
on March 8, 2022
The nanoFAB is pleased to post the following career opportunity at Norcada for a Device Production & Qualification Technician. The details of the position including responsibilities, qualifications, experiences and education are listed in the below link. Device Production & Qualification Technician
Career Opportunities – Norcada Inc.
on February 8, 2022
The nanoFAB is pleased to post the following career opportunities at Norcada for an Applications Engineer and a Fabrication and Product Engineer. The details of the positions including responsibilities, qualifications, experiences and education are listed in the below links. Applications can be submitted using the links below. Applications Engineer Fabrication and Product Engineer
New positive-tone EBL resist in stock: CSAR 62 (AR-P 6200)
on January 25, 2022
CSAR 62 can be used as a cheaper alternative for ZEP520A.
nanoFAB Winter 2021 Shutdown Schedule
on November 5, 2021
As we approach the end of another year, we would like to share our annual winter shutdown schedule. Please plan your access and work flows appropriately, as accommodations to this schedule will not be possible. Date Activity Nov 29 Chemical Clean-up Deadline. Yellow stickers Dec 3 Last Day for sample submissions Dec […]
Multilevel deep etching in silicon
on October 8, 2021
Fabricate designs with multilevel deep etched structures via DRIE