PECVD (Trion)


PECVD (Trion)

Description

This system is used for SiO2‚ and Si3N4 deposition.

Features

  • Maximum thickness of 3 ?m for SiO2‚ or 2 ?m for Si3N4 without a system clean. PECVD Si3N4 can be annealed to get tensile stress.


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