PECVD (Trion)


PECVD (Trion)

Description

This system is used for SiO₂ and Si₃N₄ deposition.

Features

  • Maximum thickness of 3 μm for SiO₂ or 2 μm for Si₃N₄ without a system clean.
  • PECVD Si₃N₄ can be annealed to get tensile stress.


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