The act of applying a thin film to a surface is thin-film deposition – any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. “Thin” is a relative term, but most deposition techniques control layer thickness within a few tens of nanometres. Molecular beam epitaxy allows a single layer ofatoms to be deposited at a time.
Source: Wikipedia
In this section
- CVD & LPCVD
Chemical vapor deposition (CVD) is a chemical process used to produce high-purity, high-performance solid materials. The process is often used in the semiconductor industry to produce thin films. In typical… - PVD
Physical vapor deposition (PVD) describes a variety of vacuum deposition methods used to deposit thin films by the condensation of a vaporized form of the desired film material onto… - Sputtering
Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles.[1] It only happens when the kinetic energy…