GLAD System #2 (Achilles)


GLAD System #2 (Achilles)

Features

  • Electron-beam evaporation (single pocket)
  • Magnetron sputtering (1" gun)
  • Materials: metals and Si only
  • Dual-axis (α,φ) substrate rotation
  • Reactive evaporation & sputter available (reviewed on case-by-case basis)
  • Adjustable deposition pressure (variable position gate valve & MFCs)
  • Base pressure: 7.2e-7 Torr (20 hr pumpdown)


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