RAITH150 Two EBL System

RAITH150 Two EBL System


Ultra-high-resolution, low-voltage (0.1–30 kV), electron-beam lithography tool, capable of writing structures over a 150 mm diameter wafer. Demonstrated proficiency on an SEM is a prerequisite to receiving training on this tool.


  • Field emission source with ultimate resolution <10 nm
  • Accurate field stitching (~25 nm) and overlay to better than 40 nm
  • Fixed Beam Moving Stage (FBMS) capable
  • Beam tracking capable for increased e-beam stability
  • Environmental controlled enclosure