Pattern Generator (Heidelberg DWL-200)


Pattern Generator (Heidelberg DWL-200)

Description

A commercial-quality laser pattern generator for writing photomasks. The auto-load capability of this tool enables high-quality photomasks to be produced with high throughput.

Features

  • Stocked photomask blanks consist of 100 nm Cr on soda-lime glass, 5" × 5" or 7" × 7" in size
  • 2.0 µm minimum feature size with 10 mm lens (default lens in system)
  • 0.7 µm features possible with 4 mm lens (1 µm standard)


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