Pattern Generator (Heidelberg DWL-200)

Pattern Generator (Heidelberg DWL-200)


A commercial-quality laser pattern generator for writing photomasks. The auto-load capability of this tool enables high-quality photomasks to be produced with high throughput.


  • Stocked photomask blanks consist of 100 nm Cr on soda-lime glass, 5" × 5" or 7" × 7" in size
  • 2.0 µm minimum feature size with 10 mm lens (default lens in system)
  • 0.7 µm features possible with 4 mm lens (1 µm standard)