Capabilities


With over $110M worth of micro- and nanoscale fabrication and characterization equipment and infrastructure, our instruments and cleanroom laboratory provide access to a wide variety of capabilities. With our dedicated staff  for training and on-site technical assistance for process development and analysis, we are an unparalleled Canadian academic facility supporting research and development.


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In this section

  • Our Equipment
    A complete listing of all of the equipment available in the nanoFAB facility. This section includes photos as well as features of the various tools.
  • Resource Library
    General Documents Safety Policies User Forms General information By Functional Area Electron Beam Lithography Optical Mask Making Optical Lithography Plasma/Dry Etching PVD CVD Furnaces…
  • Etch
    Etching is used in microfabrication to chemically (or physically) remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module, and every wafer…
  • Lithography
    The nanoFAB supports two lithography processes – Photolithography & Electron Beam Lithography. Photolithography, also termed optical lithography or UV lithography, is a process used in microfabrication to pattern parts…
  • Deposition
    The act of applying a thin film to a surface is thin-film deposition – any technique for depositing a thin film of material onto a substrate or onto previously…
  • Characterization
    Characterization, when used in materials science, refers to the use of external techniques to probe into the internal structure and properties of a material. Characterization…