Heidelberg MLA150

Description

The MLA150 is a high-speed direct-write photolithography tool. Using laser light impinging on a digital micromirror array, the system exposes patterns from a CAD file directly onto photoresist-coated substrates, eliminating the need for a photomask, and resulting in a significantly shorter prototyping cycle.

Features

• Substrates from 5 × 5 mm² up to 150 × 150 mm² can be directly patterned without the use of photomasks
• Two light sources: 405 nm (for standard g/h/broadband photoresists) and 375 nm (for i-line resists such as SU-8)
• Minimum feature size of 1 µm
• 100 × 100 mm² substrates patterned in less than 10 minutes (405 nm, dose of 100 mJ/cm²)
• Alignment accuracy of 500 nm (topside) / 1 µm (backside)
• Real-time pneumatic and optical auto-focus systems
• Greyscale photolithography (128 grey levels)
• Draw Mode for CAD-less exposure (no design file required)
• High Aspect Ratio Mode, for vertical sidewalls when exposing thick resists