Minibrute Top Furnace (Thermal oxide only)


Minibrute Top Furnace (Thermal oxide only)

Description

Manual wet oxidation furnace for thermal oxidation of bare Si wafers only. Data exists for 100 nm–1.5 μm of SiO2 growth.

Features

  • 100 mm, bare Si wafers only
  • Wet oxidation via nitrogen bubbled through DI water (must be refilled manually every 45 minutes)
  • Maximum temperature of 1050 °C


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