ICPRIE (Cobra Metal Etch)

ICPRIE (Cobra Reactive Etch)


A versatile, load-locked ICPRIE tool primarily used for etching metals with chlorine-based chemistries.


  • Non-toxic gases: Ar, O2, SF6, CHF3
  • Toxic gases: Cl2, BCl3, HBr
  • Continuous quartz clamping with He backside cooling
  • 100 mm & 150 mm wafer handling available
  • 5 kW ICP generator
  • LN2 Cooling with high-temperature platen (–110 °C to +400 °C)
  • Single-wafer load lock