Sputtering System #1 (Bob)

Sputtering System #1 (Bob)


A planar magnetron sputter system with three guns, for deposition of metals. The gun/substrate configuration is designed for sequential sputtering.


  • Three 3" Planar Magnetron sources, one gun with strong magnets to sputter magnetic materials.
  • Single DC power supply
  • Cryopumped with a base pressure of 1e-7 Torr
  • Manual Operation
  • Can hold 4 substrates (100 mm wafers)
  • Tooling available for small and irregular pieces
  • Rotating substrate holder.