Archives for May 2009
- DUV installed on Mask Aligner #2
May 21, 2009
We’ve recently setup Mask Aligner #2 (Elmo) into it’s “DUV” configuration (254nm). Normally, this system exposes subtrates… - E-Beam Lithography Training
May 13, 2009
Training for the Raith 150 EBL System has now been scheduled. - Did you know…
May 7, 2009
We have upgraded our Filmetrics thin film measurment software. - 24 Hour Access
May 3, 2009
The nanoFAB is a 24 hour, 7 day a week facility. Equipment is available at your convenience,…