Founded in 1999, the nanoFAB has grown to become one of the premier micro & nanofabrication facilities in Canada.
Open access facility - available for use by researchers and industry across the country.
High-quality photomask fabrication, characterization services, and process application support.
Full range of fabrication capabilities from CAD design, through deposition, lithography, etch, characterization, and packaging.
Announcements about a range of topics in and around the nanoFAB.
We’ve recently setup Mask Aligner #2 (Elmo) into it’s “DUV” configuration (254nm). Normally, this system exposes subtrates at 365nm & 405nm. The system will return to normal “UV mode” on June 19/09.
If you plan on using the DUV mode on this system, remember to recalculate your exposure time. We’re using a brand new DUV bulb & the intensity is quite a bit different. Any questions, contact a staff member.
