Seminar on direct-write lithography (Advanced Micro Patterning) – August 29th, 2018

The nanoFAB invites you to attend a public seminar on direct-write (maskless) lithography, presented by Jay Sasserath from Advanced Micro Patterning. From 2:30–3:30 p.m. on Wednesday, August 29th, 2018, Dr. Sasserath will present a technology and applications overview of AMP’s maskless lithography tools. A general question-and-answer period will immediately follow the presentation.

Light refreshments will be provided prior to the seminar.

Title:  “Lithography for Fabrication of MEMS Sensors and IoT Devices: Using Standard Processes for Patterning Non-Standard Materials”
Date:  Wednesday, August 29th, 2018
Time: 2:30–3:30 p.m.
Location: ETLC E1-008

Abstract:  Although there is a significant push to move to additive processing techniques to reduce the cost of sensor manufacturing for IoT applications, standard photolithography is still the dominant technique for fabricating these devices. Issues arise with this technique, since new materials and non-standard/non-silicon devices are required. Fixturing of these substrates during processing, chemical compatibility of the new materials vs. existing processes, and temperature limitations are all significant issues that will affect device performance, cost, and yield. Solutions will be presented for these and other issues, as related to lithographic processing. Finally, many examples of non-standard devices will be shown and the processing used to fabricate them presented.

Presenter: Jay Sasserath, General Manager, Advanced Micro Patterning (Rave NP Inc.)

Please register to confirm your attendance by 5:00 p.m., August 27th, 2018.