EBL Seminar Announcement

The nanoFAB will be hosting a Raith Seminar on Wednesday May 23 at 11:00 am in ECERF W2-021, titled “Novel Patterning Strategies by Modulated-Beam Moving Stage (MBMS) on the RAITH150-TWO”.

This seminar is open to anyone interested in learning more about the advanced features of the Raith 150-TWO Electron Beam Lithography System.

Please feel free to distribute this seminar notification to any of those who might be interested.