Thursday January 21 – Optical Stepper Projection Lithography Lecture

The nanoFAB is excited to announce that on January 21st, we are hosting in partnership with Micralyne Inc, a presentation on Optical Stepper Projection Lithography, a non contact lithography method capable of fast, high throughput, sub 500 nm patterning. We are encouraging all nanoFAB community users and research groups to attend.

When:  January 21, 2010 @ 2 pm

Location:  NREF Rm 2-003

This presentation will serve as an excellent opportunity for a general introduction to the nanoFAB’s newly acquired ASML 5500 projection lithography system, capable of micro and nano scale lithography. This lecture is recommended to nanoFAB community users and research groups with a focus or interest in lithography patterning for MEMS, microfluidics and thin film technology.  While a familiarity with contact lithography may be helpful it is not necessary.

Specific areas of discussion will include,

Overview of capabilities, strengths and operation.

What is a reticle? Design rules, features and real estate considerations.

Processing considerations for writing and other practical tricks.

This lecture is in support of the ASML optical stepper system recently purchased by the University of Alberta and supported by Micralyne Inc. through a partnership with the nanoFAB.  Micralyne Inc is a spinoff company started at the University of Alberta in 1982 and is now one of the largest independent MEMS foundries in the world.

There will be time for Q & A following the lecture including a brief discussion on how to access the tool.  Light refreshments and snacks will be offered.

If you have any questions or comments please email

All are welcomed!