The nanoFAB is pleased to announce that we are now offering 100 kV electron-beam lithography (EBL) exposure as a service to our academic users, to supplement our 30 kV EBL capabilities. We invite any academic users needing EBL who would benefit from higher throughput, higher resolution, and improved stitching and overlay precision to submit specimens for exposure. Until Fall 2019, we will be offering this service at no cost; upon completion of this initial trial period, the work will be charged to users’ projects on a cost-recovery basis. For more information, including instructions on how to submit specimens, please see the Electron-beam lithography service page on our website.
