Electron-beam lithography simulator


EBL Simulator is a novel tool for the prediction, visualization, and analysis of electron-beam lithography for features ranging from a few nanometres to the microscale. The simulator provides 3D modelling with 1 nm resolution for electron-beam exposure, fragmentation, and development profiles in common positive-tone EBL resists. Individual nanoscale structures, periodic arrays, and parts of large writing patterns of arbitrary geometry are handled with full accounting for forward and backscattering of electrons, as well as for secondary electron generation.

This software package is available at no cost to all nanoFAB users. Please contact Maria Stepanova for further licensing details.

EBL_Sim

Features

  • Resist main-chain scission by electron beam exposure (1–100 kV)
  • Development modelling for different durations and temperatures
  • Detailed 3D scission yield distribution and dissolution profiles for PMMA and ZEP resists on various substrates
  • Powerful plotting tool allows visualisation of 3D distributions and 2D cross-sections of simulation results
  • User-friendly graphical interface, extensive default settings, built-in help tool
  • Versions for 32- and 64-bit Windows

Downloads

  • Brochure (overview of EBL Simulator capabilities) [.pdf]
  • User manual [.pdf]
  • The installation packages (EBL_Simulator_32bit.zip and EBL_Simulator_34bit.zip) can be downloaded by nanoFAB users via LMACS: Facility menu → Resources → Applications

References

  • M. Stepanova et al., “Simulation of electron beam lithography of nanostructures”, J. Vac. Sci. Technol. B, 28, C6C48 (2010) [.pdf]
  • R. Peters et al., “Study of multilayer systems in electron beam lithography”, J. Vac. Sci. Technol. B, 31, 06F407 (2013) [.pdf]

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