nanoFAB Presents: EBL Advanced Topics Seminar

Are you an EBL user interested in learning more about GDSII pattern design or predicting the outcome of your patterning?  Then the EBL Advanced Topics Seminar is for you.

Friday October 4th, 2013 at 9:00 am

RSVP Melissa Hawrelechko (melissa.h[at] to reserve your spot.

E-Beam Lithography Simulator

Presented by: Dr. Maria Stepanova, Adjunct Professor Physics

Simulator is a novel tool for the prediction, visualization and analysis of electron beam lithography of features ranging from a few nanometers to the micro-scale. The simulator provides 3D modelling with one nanometer resolution for e-beam exposure fragmentation as well as for development profiles in common positive tone resists PMMA and ZEP. Find the simulation details and examples, and explore the modeling tools to predict and design your EBL processes.  This tool is available to all nanoFAB users and is accessible on the common area computers.

Raith_GDSII: A toolbox for Raith pattern generation using MATLAB

Presented by: Dr. Aaron Hryciw, NINT Research Associate

The Raith_GDSII toolbox provides a simple, versatile, and scriptable means of generating patterns for Raith electron-beam lithography (EBL) and focused ion beam (FIB) tools using MATLAB.  Raith-dialect GDSII hierarchy (.csf) and positionlist (.pls) files can be written directly within MATLAB, allowing users to complete the entire pattern generation and chip layout process without requiring access to proprietary Raith EBL/FIB software.   Full support is provided for beam dose factor information and the implementation of Raith curved elements (arcs, circles, and ellipses).  The relevant objects may be manipulated using standard MATLAB functionality, making scripting easy.  Furthermore, structures may be plotted using the standard Raith dose factor colourmap—from individual low-level elements to entire positionlists—to aid in visualisation and error-checking during the design cycle.  The Raith_GDSII toolbox is open-source software, available at