Featured Articles
Featured articles highlight important events that take place within our facility and also those of special interest to our user community.
Structure zone model calculator
June 8, 2022
Predict the microstructure of sputtered films using our structure zone model calculator.
Stephanie Retirement Announcement
May 30, 2022
After 21 years, and as the first hire in the nanoFAB, Stephanie has announced her retirement. Her official last…
Lithography area upgrade
May 29, 2022
Major upgrade to core lithography tools
4D X-Ray Microscopy is Available.
May 19, 2022
In-situ analysis and deep learning segmentation
Choose the right techniques for multi-layer film analysis
April 25, 2022
Cross sectional analysis plays an important role in thin film characterization. Various techniques are available at the…
Career Opportunities – Norcada Inc.
March 8, 2022
The nanoFAB is pleased to post the following career opportunity at Norcada for a Device Production &…
New positive-tone EBL resist in stock: CSAR 62 (AR-P 6200)
January 25, 2022
CSAR 62 can be used as a cheaper alternative for ZEP520A.
Hitachi S4800 FESEM is Available
January 2, 2022
The nanoFAB is pleased to announce that a Hitachi S4800 FESEM has been fully commissioned and now…
Multilevel deep etching in silicon
October 8, 2021
Fabricate designs with multilevel deep etched structures via DRIE
Multi-Ion Beam FIB/SEM is Operational
October 8, 2021
TEM Sample Preparation and Advanced Ion Milling