We will be offering our Introductory Safety Course at 1PM on Wednesday, May 5/10. The course has been heavily modified and condensed down to a one time 3 hour lecture. This course will be offered every 2 months (as opposed to 4 months), so if you miss out on this upcoming course you can expect […]
DUV Lithography Processing at the NanoFab
on April 20, 2010
Our middle optical mask aligner (Elmo) will be kept as a DUV aligner. This means that the wavelength of the mask aligner will be kept at 254 nm. We have a number of users who need this wavelength
More Optical Lithography Qualification Information
on April 20, 2010
One of the critical items in doing more than one layer lithography is how accurately the second (or further masks) can be aligned to the first layer. If the optical mask aligners are abused, this overlay accuracy becomes a problem.
Cleanroom closure – Wednesday April 14/10
on April 12, 2010
The U of A trades will be performing fan maintenance that will require a temporary shutdown of the fans in the cleanroom. There will be no access to the cleanroom from 6AM until 9AM on April 14th as this will effect both supply and exhaust air. Any questions or comments, please contact Keith.
STS ICPRIE is operational
on March 25, 2010
Some news a lot of you have been waiting for, the STS ICPRIE system is back up and running. We’ve ran a few thousand cycles of standard processes to verify the system is up to spec., with things progressing well.
Reminder: Introductory Training Course, March 3/2010 – 1PM
on March 1, 2010
We will be offering our Introductory Safety Course at 1PM on Wednesday, March 3/10. The course has been heavily modified and condensed down to a one time 3 hour lecture.
Researcher awarded NSERC funding for NanoFab project
on February 26, 2010
Congratulations to Dr. Fedosejevs who has been awarded research funding for his alternative energy project. He has been a long time nanoFAB supporter and part of his recently funded work has been occurring in the nanoFAB. Please click here to read more about it.
Mask Aligner DUV mode
on February 12, 2010
The UV/DUV mask aligner (Elmo) has been changed over to DUV (254nm). As of February 15th it will be available for DUV use. Please book and log in as per usual and take note that the EE457 labs are running from 3 to 5 PM on Tuesdays through Thursdays so there will be increased traffic […]
Equipment Upgrade – Photomask Cleaning Station
on February 8, 2010
We’ve recently upgraded our photomask cleaning station. We have just finished installing a much more modern and easy to use photomask cleaning station. To see it, click here. If you’d like to use this new tool, please contact Stephanie or Jolene.
DI Water Shutdown – Friday, Feb. 5/10
on February 2, 2010
As part of our ongoing Deionized Water plant upgrade, there will be a shutdown of the DI plant from 7:30AM – to 12:00PM on Friday February 5/10.