Kurt J. Lesker 150LX ALD system now open for training

The nanoFAB is pleased to announce that our newly installed and commissioned KJLC 150LX Atomic Layer Deposition system is now fully operational and available for training to all nanoFAB users. The ALD offers excellent uniformity and controlled growth of a variety of films on an atomic scale. Its high-vacuum load-lock and UHV-type sealing, combined with near-constant high-purity Ar flow, enable high-purity process conditions and excellent quality films.


Main system features include:


Currently available processes include:

Aluminium oxide (Al2O3)

Silicon dioxide (SiO2)

Hafnium oxide (HfO2)

Zirconium oxide (ZrO2)

Silicon nitride (Si3N4)

Titanium nitride (TiN)

Aluminum nitride (AlN)

Refer to the process information page for up to date and detailed information.


Al2O3 film properties

Graph displaying optical constants from "Al2O3_Thermal_ALD_cl.mat". The blue line represents the refractive index n, while the maroon line indicates the extinction coefficient k. X-axis: wavelength (nm), Y-axis: indices. Data prepared using a Kurt J. Lesker ALD system for advanced training purposes.
Thermal Al2O3 wafer map from the Kurt J. Lesker 150LX ALD system shows thickness variation, with data points on a gradient scale from 52.6 to 53.5 nm. Sample diameter: 100 mm, 3 mm edge exclusion, open for training and analysis sessions.

The KJLC 150LX ALD is available to users for self-use (after training) and fee-for-service work. Any users interested in getting trained on this tool should submit a training request via LMACS. If you have any questions, please contact Aaron Hryciw (ahryciw@ualberta.ca) or Scott Munro (smunro@ualberta.ca).

nGauge AFM is now Available at nanoFAB

The nanoFAB is pleased to announce that the new Atomic Force Microscopy system, the ICSPI nGauge AFM, has been successfully installed and is operational now. This benchtop AFM allows nanoscale topography data collection with 3 easy steps: automatic sweep, approach, and scan. The nGauge AFM is a laserless system, based on a patented AFM-on-a-chip technology. In this new technology, all of the sensors and scanners of a traditional AFM have been integrated onto a single chip, so you can capture routine scans in just over a minute.

The nGauge AFM operates in the tapping mode and generates topography, phase, and error images simultaneously for any solid samples (including conductive and non-conductive, but not liquid samples). nGauge AFM tips are made of durable materials like diamond-like carbon (DLC) and aluminum oxide, which are also integrated onto the AFM chip, enabling hundreds (or thousands) of scans possible with each tip.

(a) The benchtop nGauge AFM. (b) AFM chip and its integrated components. (c) Front view of the Diamond-Like Carbon and Aluminum tips. (d) 3-step scan collection via nGauge AFM

nGauge AFM Specifications:

Sample: Shale (before and after ion milling processes)
Sample courtesy of Graham Spray, M.Sc., P.Geo., AGAT Laboratorie.

Diamond-Like Carbon (DLC) Tip Specification:

nGauge AFM tips are made of diamond-like carbon materials with high aspect ratio offering excellent lateral resolution and excellent contamination resistance.

Sample: Patterned Cr + Au / Ti on Si chip

Cantilever Specifications:

nGauge AFM tips are located at the very end of the cantilever beam and are integrated onto a micro-electro-mechanical systems (MEMS) chip. The chip features integrated lateral and vertical actuators and piezoresistive sensors.

The nGauge AFM is now available to users for both staff analysis and self-use/user training provided they purchase own nGauge AFM chip. Any users interested in getting trained on this tool or staff analysis should submit a request via LMACS. If you have any questions, please contact Dr. Nas Yousefi or Peng Li – the Characterization Group Manager.

Sample: Polymeric Membrane
Sample courtesy of Dr. Sadrzadeh, Mechanical Engineering Department, Faculty of Engineering, University of Alberta.