Raith 150 EBL System


Raith 150 EBL System

Description

Ultra high resolution, low voltage (0.1 - 30 keV), electron beam lithography tool, capable of writing structures over a 150 mm diameter wafer. You must be an advanced user of the LEO 1430 before receiving training on this system.

Features

  • Field emission source with ultimate resolution 20 nm
  • Accurate field stitching (~50 nm) and overlay to better than 40 nm
  • Fixed Beam Moving Stage capable

DOCUMENTATION:


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