IBSS Chiaro Plasma Contamination Control System.

The nanoFAB has received a loaner Chiaro High Vacuum Plasma Contamination Control Unit from IBSS Group Inc. The Chiaro system utilizes a remote inductively coupled low-pressure RF plasma source (GV10x DownStream Asher), which provides an advanced method of cleaning carbon contamination for electron microscopy samples. A GV10x DownStream Asher Unit is installed on our Zeiss Sigma FESEM to clean both chamber and samples inside the microscope. Examples of cleaning results can be found here. As a stand alone unit, the Chiaro system can process both TEM and SEM samples with the following features:

  • Pre-clean samples in TEM holders
  • Pre-clean multiple SEM samples on pin stubs
  • Clean and Store TEM holders under high vacuum
  • Low operating power range (5-100 Watts RF Power) ensures no-damage to the samples (i.e. no heating, sputtering, or etching)
  • Hydrogen gas mixtures reduce contamination on organic samples

Additional applications are also available:

  • Tests liquid/gas cell sample vacuum integrity via high conductance TMP before introducing to EM
  • Plasma clean liquid/gas cells after tests
  • Plasma treat specimen surfaces: make hydrophobic surfaces hydrophilic

Please contact Peng Li (Peng.Li@ualberta.ca), if you like to run some test cleaning for your TEM and SEM samples, as well as any of the above application.