The nanoFAB invites you to attend a public seminar on direct-write (maskless) lithography, presented by Gregg Moore from Heidelberg Instruments. From 3:30–4:30 p.m. on Wednesday, September 12th, 2018, Gregg will present a technology and applications overview of Heidelberg’s maskless lithography and related direct-write tools. A general question-and-answer period will immediately follow the presentation.
Light refreshments will be provided prior to the seminar.
Title: “From Micro to Nano: Requirements and Solutions for High End Direct Write Lithography”
Date: Wednesday, September 12th, 2018
Time: 3:30–4:30 p.m.
Location: ETLC E1-018
Abstract: Heidelberg Instruments is a manufacturer of innovative direct write laser lithography solutions, from economical tabletop systems such as the µPG 101, to high-throughput Maskless Aligners such as the MLA150, to high-resolution, high-precision systems such as the DWL 66+.
This talk will provide an overview of the broad range of direct write lithography solutions, beginning with new features that are available on the MLA150 Maskless Aligner system. Further, we will explore several new technologies that extend the capabilities of current lithography systems that lead to high resolution and high precision, such as the newly available “High Resolution” mode on the DWL 66+ capable of producing structures down to 300 nm in size. Relevant applications for each respective system, such as MEMS, microfluidics, and micro-optics (greyscale) are discussed in detail. Finally, the audience will get an introduction to “Thermal Scanning Probe Lithography” (TSPL), a novel technique for nano-scale patterning as used in the NanoFrazor systems by SwissLitho.
Presenter: Gregg Moore, Technical Sales Engineer (Heidelberg Instruments, Inc.)
Please register to confirm your attendance by 5:00 p.m., September 10th, 2018.
