Seminar on atomic layer deposition (Veeco) – December 5th, 2018

The nanoFAB invites you to attend a public seminar on atomic layer deposition, presented by Ritwik Bhatia from Veeco Instruments. From 2:00–3:00 p.m. on Wednesday, December 5th, 2018, Dr. Bhatia will present a technology and applications overview of Veeco’s ALD technologies. A general question-and-answer period will immediately follow the presentation.

Light refreshments will be provided prior to the seminar.

Title:  “Atomic Layer Deposition: Introduction and Selected Applications”
Date:  Wednesday, December 5th, 2018
Time: 2:00–3:00 p.m.
Location: ETLC E2-001

Abstract:  Atomic layer deposition (ALD) is a thin-film deposition technology that is widely used for its ability to deposit thin, high-quality, conformal films. This has led to industrial applications in microelectronics, photovoltaics, etc. However, the salient features of ALD make it well suited for use in a much more diverse set of applications in nanoscale research. After a brief introduction to the principles of ALD, the bulk of this presentation will be focused on recent research where ALD is used in (a) deposition of 2D semiconductors like MoS₂, (b) growth of III-N semiconductors like AlN, InN and AlGaN, (c) bio-medical applications such as an in vitro study showing ALD TiO₂ enhances bone growth while suppressing bacterial growth, (d) deposition of materials of interest in energy storage, for instance YSZ for fuel cells or LiPON for batteries, and (e) photonics and optical applications like colorization and anti-reflective coatings.

Presenter: Ritwik Bhatia, Senior Research Scientist (Veeco Instruments)

Please register to confirm your attendance by 5:00 p.m., December 3rd, 2018.