Seminar on 100 kV electron-beam lithography (Raith Nanofabrication) – October 18th, 2017

The nanoFAB invites you to attend a public seminar on 100 kV electron-beam lithography, presented by representatives from Raith Nanofabrication. From 2:30–4:30 p.m. on October 18th, 2017, Mike Butler and Andre Linden will present a technology and applications overview of Raith’s 100 kV EBPG series tools. A general question-and-answer period will immediately follow the presentation.

Light refreshments will be provided prior to the seminar.

Title:  “State-of-the-art electron-beam lithography with the Raith 100 keV EBPG series systems”
Date:  Wednesday, October 18th, 2017
Time: 2:30–4:30 p.m.
Location: ETLC E1-008

Abstract:  Raith has been a leading provider of precision nanofabrication instruments for more than 40 years. Its product portfolio includes SEM-based turn-key electron-beam lithography (EBL) solutions, FIB nanofabrication instruments, nanolithography upgrade kits for existing SEMs and FIBs, and high performance Gaussian Beam EBL systems. The roots of the latter technology at Raith go back via Vistec to Leica, Philips, and Cambridge Instruments. The EBPG5200 represent the state-of-the-art e-beam lithography technology in terms of resolution, accuracy, and throughput. The latest generation of Raith’s highly successful and field-proven EBPG series, the EBPG5200 features 100 kV accelerating voltage, a 100 MHz, 20-bit pattern generator, 1 mm field size operation, and a fast stage, with a 10mm-range in the Z-axis. The system provides very high flexibility, together with a high degree of automation. It incorporates an interactive graphical user interface (GUI) that allows ease of use for diverse, multi-user environments. Its high-current density column design minimizes exposure time for complex nano-patterning. The EBPG systems have seen a wide range of applications in the fields of electronics, photonics, quantum computing, nanoimprint, and more interdisciplinary research. We will present results to demonstrate that the system is capable of achieving 5 nm resolution, placement accuracy < 10 nm, and utilizing high beam current to expose dense gratings over large areas with very high throughput. These capabilities, together with the advanced automation and system control, have allowed researchers and industrial users to successfully fabricate advanced devices, such as zone plates, phase-shifted gratings, waveguides, and other photonic elements, T-gates, and more. Substrates can vary from a small chip with the size of a few millimetres to a full 200 mm wafer. With the state-of-the-art Z-lift stage, the EBPG5200 is capable of lithography on curved surfaces.

Presenters: Mike Butler (Product Manager, Raith B.V.) and Andre Linden (Applications Scientist, Raith America)

Please register to confirm your attendance by 3:00 p.m., October 13th, 2017.