The nanoFAB, Zeiss and Oxford will be organizing two microscopy workshops during the 2016 Microscopic Society of Canada conference:
- (Zeiss) Correlative Microscopy: from light to electron/ion to X-ray.
- (Oxford) Advanced SEM/EDX/EBSD techniques for material science application: simultaneous EDX/EBSD and non-destructive thin film thickness measurement by SEM/EDX
We will present seminars and hands-on demonstrations at the nanoFAB characterization facility, including the newly installed ZEISS ORION NanoFab He Ion Microscope (HiM) and Zeiss Sigma FESEM equipped with Oxford EDX/EBSD.
Detailed schedule is as below. Seminars are open to the public, but hands-on demonstrations have limited space and registration is required to attend. Please register here (Zeiss correlative microscopy and Oxford EDX/EBSD) for the demos.
If you have any question, please contact Peng Li (Peng.Li@ualberta.ca).
(Zeiss) Correlative Microscopy: from light to electron/ion to X-ray
Date: June 9, 2016 [Open to the research community at University of Alberta]
Date: June 10, 2016 [Priority to attendees of the MSC 2016 conference]
Seminars
Time: 9:30 – 11 a.m.
Location: ETLC E1-018
Hands-on Demonstration (limited space—registered attendees only)
Time: 11 – 3 p.m.
Location: UA nanoFAB Center (ECERF W1-060)
Registration here.
(Oxford) Advanced SEM/EDX/EBSD techniques:
Date: June 10, 2016 [Priority to attendees of the MSC 2016 conference]
Seminars
Time: 9:30 – 11 a.m.
Location: ETLC E1-017
Hands-on Demonstration (limited space – registered attendees only)
Time: 11 – 3 p.m.
Location: UA nanoFAB center (ECERF W1-060)
Register here.