Founded in 1999, the nanoFAB has grown to become one of the premier micro & nanofabrication facilities in Canada.
Open access facility - available for use by researchers and industry across the country.
High-quality photomask fabrication, characterization services, and process application support.
Full range of fabrication capabilities from CAD design, through deposition, lithography, etch, characterization, and packaging.
Announcements about a range of topics in and around the nanoFAB.
The Heidelberg Pattern Generator will be placed offline from June 12 – 22 for routine maintenance. Masks submitted prior to June 9 will be completed before the shut down. Masks submitted on or after June 9 will be completed as soon as possible after June 22.
For further information regarding optical mask generation please contact Les Schowalter.
