Cryo Etch for Silicon (Oxford ICPRIE)

Our Oxford Instruments ICPRIE has been repositioned in order to make space for a new etcher (which will be usable very soon).  The Oxford Instruments ICPRIE is now only to be used with the Cryo Process for Silicon Etching. The system can reach -160C and offers smoother sidewalls than with the Bosch process.  For more information on this tool, look here.  If you’d like to schedule some training on this tool, please contact Scott.